MT29F512G08EBHAFB17A3WC1-FES

IC FLASH 512GBIT PARALLEL DIE
Part Description

IC FLASH 512GBIT PARALLEL DIE

Quantity 29 Available (as of May 6, 2026)
Product CategoryMemory
ManufacturerMicron Technology Inc.
Manufacturing StatusObsolete
Manufacturer Standard Lead TimeRFQ
Datasheet

Specifications & Environmental

Device PackageDieMemory FormatFLASHTechnologyFLASH - NAND (TLC)
Memory Size512 GbitAccess TimeN/AGradeCommercial
Clock FrequencyN/AVoltage2.5V ~ 3.6VMemory TypeNon-Volatile
Operating Temperature0°C ~ 70°CWrite Cycle Time Word PageN/APackagingDie
Mounting MethodNon-VolatileMemory InterfaceParallelMemory Organization64G x 8
Moisture Sensitivity Level3 (168 Hours)RoHS ComplianceROHS3 CompliantREACH ComplianceREACH Unknown
QualificationN/AECCNOBSOLETEHTS CodeN/A

Overview of MT29F512G08EBHAFB17A3WC1-FES – IC FLASH 512GBIT PARALLEL DIE

The MT29F512G08EBHAFB17A3WC1-FES is a 512 Gbit non-volatile flash memory die from Micron Technology Inc. It implements NAND flash technology (TLC) in a parallel interface format and is supplied as a die for integration into custom packages or modules.

Designed for applications that require high-density, parallel-access flash storage, the device provides a 64G × 8 memory organization and operates across a 2.5 V to 3.6 V supply range with an operating temperature of 0°C to 70°C.

Key Features

  • Memory Core  Non-volatile NAND flash using TLC technology, providing multi-level storage in a single die.
  • Capacity & Organization  512 Gbit total capacity with a 64G × 8 memory organization for parallel byte-wide access.
  • Interface  Parallel memory interface suitable for designs that require byte-wide NAND access.
  • Power  Wide supply range of 2.5 V to 3.6 V to support varied system voltage domains.
  • Package  Supplied as a die (Package/Case: Die, Supplier Device Package: Die) for custom integration and assembly workflows.
  • Environmental  Operating temperature range of 0°C to 70°C for standard commercial-temperature applications.

Typical Applications

  • Parallel flash storage systems  Used where parallel NAND flash is required for byte-wide storage and direct-memory access designs.
  • Embedded memory integration  Integrated as a die into custom modules or assemblies that demand high-capacity non-volatile memory.
  • Custom module assembly  For manufacturers assembling memory modules or devices that incorporate die-level NAND flash.

Unique Advantages

  • High-density storage: 512 Gbit capacity enables substantial non-volatile storage within a single die footprint.
  • Parallel-access organization: 64G × 8 organization provides byte-wide parallel access for legacy or specialized parallel memory interfaces.
  • Flexible supply voltage: 2.5 V to 3.6 V support allows integration with common system voltage rails.
  • Die form factor: Supplied as a die for direct integration into custom packaging or module designs, enabling tailored assembly approaches.
  • TLC NAND technology: Triple-level cell NAND provides higher bit density per cell for storage-focused designs.

Why Choose IC FLASH 512GBIT PARALLEL DIE?

The MT29F512G08EBHAFB17A3WC1-FES positions itself as a high-density, parallel-interface NAND flash die suited to designs that require substantial non-volatile storage in a die-level form factor. Its 512 Gbit capacity, 64G × 8 organization, and TLC NAND technology make it appropriate for integration where parallel byte-wide access and compact die integration are priorities.

Engineers and manufacturers seeking a Micron-supplied die with a 2.5 V–3.6 V supply window and a commercial operating range of 0°C to 70°C will find this device applicable for custom memory module assembly and embedded storage integration tasks.

Request a quote or submit a pricing and availability inquiry to receive lead-time and volume-pricing information for the MT29F512G08EBHAFB17A3WC1-FES.

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